English 
Français
Deutsch
Español
Italiano
Português
日本語
한국어
Русский
Tantalum Target
![Nicocralyta Alloy Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering Targets]()
Nicocralyta Alloy Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering TargetsOverview Product DescriptionXinKang Factory Supply Top Ranking NiCoCrAlYTa alloy Nickel Cobalt Chromium Aluminum Yttrium![ACETRON 4N 99.99% High Purity Tantalum Round Target for Vacuum/PVD Coating]()
ACETRON 4N 99.99% High Purity Tantalum Round Target for Vacuum/PVD CoatingOverview Product Description Acetron Online Product Catalogue Supply Ability For evaporation materials: about 10 tons pe![High Purity Tantalum Vacuum Magnetron Sputtering Target PVD Coating]()
High Purity Tantalum Vacuum Magnetron Sputtering Target PVD CoatingFAQ:Q1: What kinds of the quality control on you provided products?A1:TQC for raw material, manufacture, outgoing, and c![ACETRON 4N 99.99% High Purity Tantalum Rotary Sputtering Target for Vacuum/PVD Coating]()
ACETRON 4N 99.99% High Purity Tantalum Rotary Sputtering Target for Vacuum/PVD CoatingOverview Product Description Acetron Online Product Catalogue Supply Ability For evaporation materials: about 10 tons pe![99.9% Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering Target for PVD Process]()
99.9% Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering Target for PVD ProcessAvailable for COA( Certificate of Analysis)Changsha Xinkang Advanced Materials Co., Ltd (XK) is an international company![R05200 Tantalum Target for Electronics Purpose]()
R05200 Tantalum Target for Electronics PurposeTantalum Target, Tantalum Sputtering Targets, Tantalum-Tungsten Alloy Targets Material: R05200, R05400, R05252(Ta-2.5W),![ACETRON 4N 99.99% High Purity Tantalum Sputtering Target for Vacuum/PVD Coating]()
ACETRON 4N 99.99% High Purity Tantalum Sputtering Target for Vacuum/PVD CoatingOverview Product Description Acetron Online Product Catalogue Supply Ability For evaporation materials: about 10 tons pe![ACETRON 4N 99.99% High Purity Tantalum Tube Target for Vacuum/PVD Coating]()
ACETRON 4N 99.99% High Purity Tantalum Tube Target for Vacuum/PVD CoatingOverview Product Description Acetron Online Product Catalogue Supply Ability For evaporation materials: about 10 tons pe![99.9% Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering Target]()
99.9% Nickel Cobalt Chromium Aluminum Yttrium Tantalum Alloy Sputtering TargetOverview Product DescriptionXinKang Factory Supply Top Ranking 3N5 99.95% Ductility Tantalum Sheet Sputtering Target for![Higher Purity 3n5 99.95% Ductility Tantalum Sheet Sputtering Target for Vacuum Coating]()
Higher Purity 3n5 99.95% Ductility Tantalum Sheet Sputtering Target for Vacuum CoatingOverview Product DescriptionXinKang Factory Supply Top Ranking 3N5 99.95% Ductility Tantalum Sheet Sputtering Target for![High Ductility Vacuum Coating Chrome Tantalum Target]()
High Ductility Vacuum Coating Chrome Tantalum TargetDetailed Photos Product Parameters Manufacturing Process Company Profile ABOUT USHUALONG HOLDING Industrial Co., Ltd. is![Ta-Mo Alloy Plate Tantalum Molybdenum Sputtering Target]()
Ta-Mo Alloy Plate Tantalum Molybdenum Sputtering TargetMo1 molybdenum sputtering target Molybdenum target Product Description: Molybdenum target is mainly used in plasma sputt
